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OUTPUT Pad and Driver

OUTPUT Pad and Driver. CLOCK DRIVER. Buffering. S = scaling or tapering factor CL = S N+1 Cg ……………… All inverters have identical delay of t o = delay of the first stage (load =Cd+Cg). 5. S. 4. 3. 0 1 2 3. Cd/Cg. Buffering.

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OUTPUT Pad and Driver

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  1. OUTPUT Pad and Driver

  2. CLOCK DRIVER

  3. Buffering S = scaling or tapering factor CL = SN+1 Cg ……………… All inverters have identical delay of to = delay of the first stage (load =Cd+Cg)

  4. 5 S 4 3 0 1 2 3 Cd/Cg Buffering If the diffusion capacitance Cd is neglected, S = e = 2.7

  5. Layout of Large Device

  6. Large Transistor Layout

  7. Output Drivers Standard CMOS Driver Open Drain/Source Driver: Single Transistors Tri-state Driver Bi-directional Circuit

  8. Tri-state Driver V DD En Out In En • Tri-state or High impedance • Used to drive internal or external busses • Two inputs: • Data In and Enable • Various signal assertions • Two types: • C2MOS • CMOS with Control Logic C2MOS

  9. Tri-state Driver V Control logic could be modified to obtain Inversion/non-inversion Active low/high Enable For large load, pre-drivers are required DD En PAD Out En In

  10. Latch-up: Trigger • Factors which trigger latch-up • transmission line reflections or ringing • voltage drop on the VDD bus • “hot plug in” of unpowered circuit board • electrostatic discharge • sudden transient on power and ground busses • leakage current across the junction • radiation: x-ray, cosmic

  11. Input PAD

  12. Protection Circuitry Principles Avalanche Punch Through

  13. Protection Circuitry

  14. Protection Circuitry

  15. Input protection • Electrostatic discharge can take place through transfer of charges from the human body to the device. • Human body can carry up to 8000V. • Discharge can happen within hundreds of nanoseconds. • Critical field for SiO2 is about 7X106 V/cm. • For 0.5u CMOS process the gate oxide can withstand around 8V • Some protection technique is required with minimum impact on performance 1.5K 1M Vesd DUT 100pF Human Body model

  16. ESD Structures Basic technique is to include series resistance and two clamping diodes. The resistance R is to limit the current and to slow down the high voltage transitions. R could be polysilicon or diffusion resistance Diffusion resistance could be part of the diode structure Typical values of R: 500 to 1k VDD R PAD

  17. Layout of ESD Structure PAD n+ p+ Guard Ring Guard Ring p+ p+ n+ n+ This structure uses transistors as clamping diodes

  18. Layout of ESD Structure VDD PAD n+ p+ Guard Ring Guard Ring p+ p+ n+ n+ GND

  19. Another ESD Structure VDD R1 R2 PAD Thick FOX MOS Transistor

  20. Bi-direct PAD V DD Pre-drivers IN ESD Protection Input Buffer PAD Control Logic EN

  21. Thank you !

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