'Thin film deposition methods' presentation slideshows

Wafer Fabrication

Wafer Fabrication. CZ processing. k o = C s /C o increases as ingot grows The dopant concentration is given by: I L =I o (1+V s /V o ) ko and C s = -dI L /dV s = C o k o (1-f) ( k o-1). Ingot diameter varies inversely with pull rate:. L = latent heat of fusion N = density

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Chapter 9 Thin film deposition

1.32k views • 42 slides

The Applications of Nano Materials

The Applications of Nano Materials. Department of Chemical and Materials Engineering San Jose State University. Zhen Guo, Ph. D. Final Review. Traditional theme mainstreaming materials science for last 5000+ years. Part I. Basic Materials Science Principles. Microstructure. Materials.

710 views • 17 slides

Study of Hafnium Dioxide (HfO 2 ) by Atomic Layer Deposition (ALD)

Study of Hafnium Dioxide (HfO 2 ) by Atomic Layer Deposition (ALD). Yen Chin Woo Master of Science in Electrical Engineering Instructor Professor Beth Stadler December 6, 2005. Outline. Background Choice of High- ? Dielectric Comparison of Deposition Methods

748 views • 12 slides