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ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS:

ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS: THE WAFER- FOCUS RING GAP* Natalia Yu. Babaeva and Mark J. Kushner Iowa State University Department of Electrical and Computer Engineering Ames, IA 50011, USA natalie5@iastate.edu mjk@iastate.edu

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737 views • 20 slides

* Work supported by National Science Foundation and Semiconductor Research Corp.

DEVELOPMENT OF ION ENERGY ANGULAR DISTRIBUTION THROUGH THE PRE-SHEATH AND SHEATH IN DUAL-FREQUENCY CAPACITIVELY COUPLED PLASMAS* Yiting Zhang a , Nathaniel Moore b , Walter Gekelman b and Mark J. Kushner a (a) Department of Electrical and Computer Engineering,

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300 views • 16 slides

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ION ENERGY AND ANGULAR DISTRIBUTIONS INTO SMALL FEATURES IN PLASMA ETCHING REACTORS:

* Work supported by National Science Foundation and Semiconductor Research Corp.