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Interference lithography - PowerPoint PPT Presentation


Advanced Optical Lithography

Advanced Optical Lithography

Advanced Optical Lithography. Lecture 14 G.J. Mankey gmankey@mint.ua.edu. The minimum resolution of an optical element is given by the Raleigh criterion:. The basic rule of thumb is that the minimum line width achievable is basically equal to the wave length of the incident radiation.

★ ★ ★ ★ ★

419 views • 11 slides



Advanced Optical Lithography

Advanced Optical Lithography

Advanced Optical Lithography. Lecture 14 G.J. Mankey gmankey@mint.ua.edu. The minimum resolution of an optical element is given by the Raleigh criterion:. The basic rule of thumb is that the minimum line width achievable is basically equal to the wave length of the incident radiation.

★ ★ ★ ★ ★

254 views • 11 slides


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