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Dry Etching of Copper Using Plasma

Dry Etching of Copper Using Plasma. Kejun Xia Semiconductor TCAD Lab. Auburn University, AL Oct 19, 2003. Outline. Background Introduction &gt; Why Copper &amp; low k for IC Interconnection &gt; Some methods of getting fine copper lines Halogens Plasma Etching &gt; Chlorine Plasma Etching

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Novel Gray-scale, Hard Photoresist – How Does It Work?

X18B-X19A. Novel Gray-scale, Hard Photoresist – How Does It Work?. A. Kovalskyy, M. Vlcek, A. Ganjoo, S. Khalid*, H. Jain Lehigh University, PA; *Brookhaven National Laboratory.

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183 views • 1 slides

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