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Manufacturing Process -II

EE4271 VLSI Design. Dr. Shiyan Hu Office: EERC 518. Manufacturing Process -II. Adapted and modified from Digital Integrated Circuits: A Design Perspective by Jan M. Rabaey, Anantha Chandrakasan, and Borivoje Nikolic. Challenge. 193 nm. Illumination source. 45 nm. Mask. Objective Lens.

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Manufacturing Process -II