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High Temperature Oxidation of TiAlN Thin Films for Memory Devices Sang-Shik Park

High Temperature Oxidation of TiAlN Thin Films for Memory Devices Sang-Shik Park Dept. of Materials Eng., Sangju National Univ. Sangju, Kyungbuk 742-711, Korea (sspark@sangju.ac.kr). Introduction. DRAM cell structure and problems.

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0 10 7 torr - PowerPoint PPT Presentation

High Temperature Oxidation of TiAlN Thin Films for Memory Devices Sang-Shik Park