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MURI Metamaterial

Xiang Zhang ’s Group. MURI Metamaterial. Internal Meeting. Department of Mechanical and Aerospace Engineering University of California at Los Angeles California Nano System Institute (CNSI). Outline. Micro-structured Magnetic Resonators

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MURI Metamaterial

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  1. Xiang Zhang ’s Group MURI Metamaterial Internal Meeting Department of Mechanical and Aerospace Engineering University of California at Los Angeles California Nano System Institute (CNSI)

  2. Outline Micro-structured Magnetic Resonators (In collaboration with Willie Padilla, David Smith, Dimitri Basov) Plasmonic Nanolithography

  3. 50um Micro-structured Magnetic Resonators Fabricated Sample • We have successfully synthesized Micro-magnetic Resonators • Minimal features: 2um • Ring thickness: 3um • Target Working Frequency: 0.7-2THz Cu, 3um L:26mm, S:10mm G: 2mm, W:4mm, d=L+S=36 μm Ti, 20nm quartz

  4. q=30o Scalable Magnetic Resonance FTIR oblique reflectance (In collaboration with Willie Padilla, David Smith, Dimitri Basov)

  5. Orientation Dependence? IR symmetric I0 q=30o E or H asymmetric Bi-anisotropic Effect

  6. Orientation Effect Ellipsometric Ratio Effort ongoing for extraction of the Bi-anisotropy (In collaboration with Willie Padilla, David Smith, Dimitri Basov)

  7. X-cut quartz (400 μm) Si wafer (500 μm) Fused quartz (400 μm) Substrate Choices Freq.=1.2 THz transmissivity 1. At 1.2 THz (resonance frequency), Tfused quartz=75% 2. Between 0.6 THz~1.5THz, Tfused quartz>TSi-wafer>Tx-cut quartz 3. Fused quartz possesses higher transmissivity in interested band. Wavenumber (1/cm)

  8. Conclusion We observe the orientation issue in FTIR measurement (in corporation with UCSD) Fused quartz has been proved to have higher transmissivity Future work Investigate the bi-anisotropic effect

  9. Background Discovery of extraordinary transmission through sub-wavelength hole arrays in infrared and visible range Ebbesen TW, et al., 1998 150nm 0.9 µm 200nm Schematic of hole arrays structure Zero-order transmission spectrum of hole arrays

  10. Our Goal : UV Plasmonic Lithography To explore surface plasmons enhanced transmission in UV range and demonstrate a novel Plasmonic Nanolithography Designed exposure wavelength : 364 nm Schematic of experimental setup

  11. Far-Field Transmission Spectra Measurement Results 364 nm (40 nm hole diameter) Normalized transmission in UV range is in the scale of the incident light

  12. Lithography results for different periods Achieve resolvable exposed results from larger periodicity samples pattern size ~250 nm, period 320 nm pattern size ~120 nm, period 500 nm

  13. Sub-100 nm nanolithography Sub-100nm features obtained from aperture ~1/6 of the exposing wavelength 60 nm hole diameter 80 nm hole diameter 2 exposure time 7 sec (56 mJ/cm ), spacer thickness 50 nm, period 500 nm

  14. Achieve extraordinary strong transmission in UV range Further enhance the resolution of Plasmonic Nanolithography Demonstrated sub-100 nm features lithography at the distance 50 nm above the mask Conclusion Future Work

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