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Pixel Sensors for the CMS Experiment. Purdue University. Amitava Roy Carsten Rott Daniela Bortoletto Gino Bolla. Wafers. 3 non-oxygenated wafers from CSEM 2 non-oxygenated and 1 oxygenated wafer from Sintef. Breakdown Voltage. CSEM. Design Optimization.

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pixel sensors for the cms experiment
Pixel Sensors for the CMS Experiment

Purdue University

Amitava Roy

Carsten Rott

Daniela Bortoletto

Gino Bolla

wafers
Wafers
  • 3 non-oxygenated wafers from CSEM
  • 2 non-oxygenated and 1 oxygenated wafer from Sintef
design optimization
Design Optimization
  • Pixels with metal on top have higher breakdown voltage.
  • 3 best designs - design A, F & G

G

A

F

leakage current
Leakage Current
  • CSEM - 50-100 nA/cm2
  • SINTEF - 5-25 nA/cm2
oxygenated wafer
Oxygenated Wafer
  • Too sensitive to Humidity!
inter pixel resistance
Inter-pixel Resistance
  • Around 100 KOhm before depletion!
  • Around 1 TOhm after depletion !

N+

P+

V

A

A

R=V/I

Variable V

Constant V

inter pixel resistance1
Inter-Pixel Resistance

Open Double Ring

slide9

Inter-Pixel Resistance

Single Ring has lower resistance as expected

Open Single Ring

Open Double Ring

inter pixel capacitance
Inter-pixel Capacitance

N+

P+

C

Inter-pixel Capacitance 100fF

conclusion
Conclusion
  • Leakage Current  100nA/cm2
  • Best Designs - Design A, F & G with metal on top.
  • Need more wafers to get statistics about Oxygenated wafer.
  • Inter-pixel resistance - 100 KOhm before depletion, 0.1-1 Tohm after depletion.
  • Inter-pixel Capacitance - 100fF