70 likes | 199 Views
This study investigates the influence of argon ion sputtering on the secondary electron yield (SEY) of gold samples. Our findings reveal a marked increase in SEY post-sputtering, stabilizing at a maximum value of 1.7 after prolonged electron exposure. The data indicates variability in SEY by approximately 0.05 to 0.1 based on electron gun energy and emission current. We also compare results from gold with preliminary tests on aluminum oxide and magnesium oxide, noting challenges posed by high SEY and sample charging in MgO analysis. Future studies aim to refine measurements and explore low primary electron currents for improved data accuracy.
E N D
Gold as a reference Slade J., Igor V., Alex Z., Zeke I.
XPS of gold before (left) and after (right) Ar ion sputtering/cleaning
Ar sputtering clearly increases SEY of gold • The dose effect is still visible • SEY stabilizes at a maximum of 1.7
Minimum Gun Emission Maximum Gun Emission • The SEY stabilizes after long exposure • SEY varies by about 0.05 to 0.1 depending on electron gun energy and emission current
SEY is stable • 1st scan is after Ar sputtering and 2 hrs e- exposure • 12th scan is after 2.5 hours additional e- exposure • While the display showed 100eV gun energy, it’s apparent that it varies upon adjustment by ~10eV
Our results: ~650eV, 1.7 SEY • This is in reasonable agreement with others’ experiments and Zeke’s calculations.
Plans • I have already tested a few samples (Al2O3 and MgO) • MgO is by far the more difficult sample to analyze due to either high SEY or sample charging • With this information on gold I will reanalyze the alumina and magnesium oxide data and present it next week • At very low primary electron current (0.3 μA) I may be able to gather better data from MgO, but it would be limited to 100eV primary electrons. This would decrease the dose effect and limit sample charging.