1 / 7

Company Logo Below

Company Logo Below. Sign-1. Proteus Mask Synthesis - Production Qualified for 45nm Production proven for 10 years and 7 technology nodes Dual Domain simulation provides maximum flexibility Best cost-of-ownership for LRC and OPC using general purpose hardware. Sign-2 (Use same items below).

kathleen-hensley
Download Presentation

Company Logo Below

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. Company Logo Below

  2. Sign-1 Proteus Mask Synthesis - Production Qualified for 45nm • Production proven for 10 years and 7 technology nodes • Dual Domain simulation provides maximum flexibility • Best cost-of-ownership for LRC and OPC using general purpose hardware

  3. Sign-2 (Use same items below)

  4. Sign-3 PrimeYield LCC (Lithography Compliance Checking) • Built with production-proven technology used by leading Foundries and IDMs • Analysis and auto-correction links with Galaxy™ design tools • In production at major Foundry, Fabless and leading IDMs

  5. Sign-4 Hercules PVS – Production-proven at 45nm IDM and Fabless • Fastest performance up to 12 CPUs with command processing • Fastest performance for greater than 12 CPUs with data processing • Production-proven links to design with IC Compiler and Star-RCXT

  6. Sign-5 Synopsys TCAD / PA-DFM From Physics to Design • Accelerate innovation and time-to-market • Reduce development time and costs • Optimize performance and manufacturability • Improve yield and profitability • Raphael NXT (TCAD Solution) • Full-Chip 3D Capacitance Extractor • • Field-solver accurate capacitance extraction for critical nets, cells and blocks • • Accounts for detailed process effects predominant in deep-submicron technologies • -Seamless integration with market-leading STAR-RCXT full-chip parasitic extractor • -Flexibility to run Raphael NXT on single or multiple CPUs • Seismos (PA-DFM Solution) • Transistor-level analysis of stress and other proximity effects in strained-silicon technologies • Uses compact models derived from physics-based stress simulations • Handles complex geometric interactions beyond simple LOD model • Accurate and efficient • Seamless integration into existing design flows

  7. VCS(r) Native Testbench (NTB) 5X Faster Performance Sign-6 • Industry leading support for SystemVerilog and OpenVera(r) • Proven VMM methodology with next-generation VMM Planner, VMM Applications and VMM Automation extensions to speed creation of robust verification environments • Power Aware Verification support to find more bugs in low-power designs • Largest portfolio of SystemVerilog-enabled, VMM-compliant VIP provided with VCS Verification Library

More Related