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APC at Motorola-SPS

APC at Motorola-SPS. Karen McBrayer, PhD Manager Process Control Systems APRDL/IT. Outline. Before you can begin the fun stuff….. Overview of a project under development Overview of a project in production Continuing Challenges. Before you can begin the fun stuff….

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APC at Motorola-SPS

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  1. APC at Motorola-SPS Karen McBrayer, PhD Manager Process Control Systems APRDL/IT

  2. Outline • Before you can begin the fun stuff….. • Overview of a project under development • Overview of a project in production • Continuing Challenges

  3. Before you can begin the fun stuff….. • You MUST understand the basics of the opportunity • You MUST understand the company’s priorities • You MUST understand the political environment • You MUST understand the business conditions • FINALLY, you MUST sell the idea

  4. One of SPS’s Key Priorities for 2001 HiP7 by 7/7/01

  5. One of SPS-IT’s Priorities for 2001 Configure - don’t Build

  6. Information Technology Adv. Prod. R&D Lab APT Organizational Structures • Human Resources Organization APT - Automation & Process Technology ... Equipment Automation Process Char & Ctrl Process Ctrl Systems

  7. Organizational Structures • Primary Experimental & Manufacturing Organization Dan Noble Center APRDL MOS-13

  8. Tech stocks slumber after rate cut By Mike Tarsala, CBS.MarketWatch.com Last Update: 5:15 PM ET Feb 1, 2001 Business Conditions

  9. Selling the Idea • Meetings. • Meetings. • And more Meetings!

  10. Photolithography Etch ADI Metrology ACI Metrology GTE Control - a project under development • GTE is an etch process used to trim the line width of the gate from After Development Inspection (ADI) dimensions to After Clean Inspection (ACI) dimensions

  11. GTE Control - objective • The objective is to meet the required setpoint (ACI|setpt) after etch with minimal variance ADI GTE Controller Time ACI Photolithography Etch

  12. GTE Control - controller development • Feedback controller developed to control the ACI. Inputs Outputs ADI Etch time GTE Controller Model

  13. GTE Controller - step disturbance rejection GTE R2R Control: output disturbance in ACI target 0.75 Etcher 0.50 Target Norm. ACI meas 0.25 0.0 0 5 10 15 20 25 30 1.25 Norm. ACI disturb 0.63 0 0 5 10 15 20 25 30 80 60 time (sec.) 40 0 5 10 15 20 25 30 Lot Number

  14. GTE Controller - drift disturbance rejection GTE R2R Control: drift disturbance 0.75 Etcher 0.50 Target Norm ACI 0.25 0.00 0 5 10 15 20 25 30 1.25 0.63 Norm ACI disturbance 0 0 5 10 15 20 25 30 70 60 time (sec.) 50 40 0 5 10 15 20 25 30 Lot Number

  15. Photolithography ADI Metrology OL Metrology ALEC - a controller in production • Advanced Lithography Equipment Controller (ALEC) controls both OL Alignment and Dose

  16. ALEC - objectives • The objectives are (1) to minimize the difference between the actual pattern placement and the alignment marks and (2) to meet the required setpoint (ADI|setpt) with minimal variance Alignments Offsets ALEC Dose ADI Photolithography

  17. ALEC - Controls CDs to within + 2.5% of Target 1.025* Target Target 0.975*Target

  18. ALEC - reduces OL mean errors to <60nm UCL = 60 nm

  19. % Out of Control Trends With ALEC After ALEC Before ALEC Layer 1 Layer 2 Layer 3 Layer 4 Layer 5 Layer 6 Layer 7 Layer 8 Layer 9 % OOC WW9 WW10 WW11 WW12 WW13 WW14 WW15 WW16 WW17 WW18 WW19 Work Week ALEC - minimizes rework, improves cycle time & maximizes profits

  20. Continuing Challenges • Negotiating the business and political environments • Process capabilities will always be pushed to the limit • Institutionalize APC as a natural part of process development • Simplify integration of APC into the CIM systems

  21. Acknowledgements • Balakrishnan “Bala” K.S. • Keith Edwards

  22. Thanks... forthe opportunity to share my biases with you on APC development at Motorola

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