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八吋晶圓金屬鎢化學氣相沉積系統技術資料

八吋晶圓金屬鎢化學氣相沉積系統技術資料. 目錄. 一、沉積速率: >3000A/min. 4982A. 測試結果:大於 5000A/min. 二、 Rs : <210mOhm/SQ (<W film 5000A). 4982A. 測試結果: 209.5 mohm/SQ 測試厚度:小於 5000A. 三、 U %: <5%. 測試結果: 2.42% 備註:利用 Rs 的差異來說明 U %. 四、 Ncu : <3%. 測試結果: 1.5% 備註:利用 Rs 的差異來說明 U%. 五、 Stress : <1.8e10 dyne/cm2.

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八吋晶圓金屬鎢化學氣相沉積系統技術資料

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  1. 八吋晶圓金屬鎢化學氣相沉積系統技術資料

  2. 目錄

  3. 一、沉積速率:>3000A/min 4982A 測試結果:大於5000A/min

  4. 二、Rs:<210mOhm/SQ (<W film 5000A) 4982A 測試結果:209.5mohm/SQ 測試厚度:小於5000A

  5. 三、U%:<5% 測試結果:2.42% 備註:利用Rs的差異來說明U%

  6. 四、Ncu:<3% 測試結果:1.5% 備註:利用Rs的差異來說明U%

  7. 五、Stress:<1.8e10 dyne/cm2 測試結果:7.6e9 dyna/cm2

  8. 六、Step Cover:>90% 填滿90% 以上寬0.32um 深1.056um的溝槽 991.1nm 測試結果: 可以填滿90%以上 297.3nm

  9. 七、填洞能力:完整的填入寬0.32um 深1.056um(A/R 3.3:1) 286.6nm 1027.2nm 測試結果: 可以完整填入 優於(3.3:1)

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