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Nanolitografi

Nanolitografi. E-beam litografi Nano imprint litografi. Mikroskopi. SEM (scanning electron microscope ). Komponenter i SEM. Schottky emitter elektronkilde. F =-e v x B. Magnetisk linse. E-beam litografi. - Dedikerede e-beam systemer - SEM med Raith Gmbh kontrolsystem

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Nanolitografi

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  1. Nanolitografi E-beam litografi Nanoimprintlitografi

  2. Mikroskopi

  3. SEM (scanning electronmicroscope)

  4. Komponenter i SEM Schottky emitter elektronkilde F =-e v x B Magnetisk linse

  5. E-beam litografi - Dedikerede e-beam systemer - SEM med Raith Gmbh kontrolsystem og ’pattern generator’ DANCHIP

  6. Test of nanowire writingE-beam writing+RIE(Nano 9 – Tom+Jeppe)

  7. Wires and channels

  8. Optiske strukturer Diffraktive komponenter 2D grating: Periodicity - 250nm

  9. Nano Imprint Lithography (NIL)

  10. Nanowire detektor Appl. Phys. Lett. 89, 153102 (2006)

  11. Focused Ion Beam (FIB) System

  12. Focused Ion Beam Writing As the diagram on the right shows, the gallium (Ga+) primary ion beam hits the sample surface and sputters a small amount of material, which leaves the surface as either secondary ions (i+ or i-) or neutral atoms (n0). The primary beam also produces secondary electrons (e-). As the primary beam rasters on the sample surface, the signal from the sputtered ions or secondary electrons is collected to form an image.

  13. E-beam og FIB litografi • E-beam ~10 nm • FIB ~20 nm • EDX

  14. TEM samples

  15. FIB skrivningAAU-logo på et hår

  16. CVD med FIB stråle Shinji MATSUI

  17. http://www.nanonet.go.jp/english/mailmag/2006/086a.html

  18. http://www.nanonet.go.jp/english/mailmag/2006/086a.html

  19. http://www.nanonet.go.jp/english/mailmag/2006/086a.html

  20. http://www.nanonet.go.jp/english/mailmag/2006/086a.html

  21. http://www.nanonet.go.jp/english/mailmag/2006/086a.html

  22. FIB skrivningAAU-logo på et hår

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