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Fabrication pH Electrode Using Lift-Off Method and Electrodeposition

Fabrication pH Electrode Using Lift-Off Method and Electrodeposition. Presented by Na Zhang. What ’ s the Problem?. How to create clear windows in the substrate?. How to solve the problem?. Lift-Off Method LOL-2000 (bottom) S -1813 Photoresist (top). Electrodeposition. pH Sensitivity.

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Fabrication pH Electrode Using Lift-Off Method and Electrodeposition

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  1. Fabrication pH Electrode Using Lift-Off Method and Electrodeposition Presented by Na Zhang

  2. What’s the Problem? • How to create clear windows in the substrate?

  3. How to solve the problem? • Lift-Off Method LOL-2000 (bottom) S -1813 Photoresist (top)

  4. Electrodeposition

  5. pH Sensitivity Electrode #1 03-12-04_630s_30s_ph678_1.bin

  6. Electrode #503-12-05_630s_30s_ph678_1.bin

  7. End

  8. Reference Procedure • 1) Clean substrate • 2) Spin spacer layer LOL-2000 @ 3000 rpm for 200nm thickness • 3) Bake 140 C on hot plate for 5 minutes • 4) Spin resist layer S-1813 @ 4000 rpm for 1.3 um thickness • 5) Bake 110 C on hot plate for 2 minutes • 6) Expose through pattern mask, 45s @ 2.45 mW/cm2 (110 mJ/cm^2 nominally)at UV250 mask aligner, intensity measured using the 400nm probe. • 15 s @ 10 mW/cm2 (150 mJ/cm^2 nominally) at UV400 mask aligner. • 7) Develop in MF319 for 30 sec, CAREFUL agitation • 8) Rinse in DI water • 9) Blow dry CAREFULLY. • 10) Ash at 50W 250mTorr Oxygen for 30 s • 11) Deposit thin film • 12) Lift off in NMP (Remover 1165)

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