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NANOHARD 2007. MF pulsed DC power supplies for PVD processes . Milko Angelov. Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria. www.mac-co.dir.bg. NANOHARD 2007. PURPOSE

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slide1

NANOHARD 2007

MF pulsed DC power supplies for PVD processes

Milko Angelov

Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria

www.mac-co.dir.bg

slide2

NANOHARD 2007

  • PURPOSE
  • Presentation of developed MF pulsed DC power supplies for reactive film deposition with special attention to reactive magnetron sputtering and substrate biasing.
  • Target poisoning and arc management. How to increase ionization and simultaneously to decrease arc formation probability.
  • Introduction of our new equipment for deposition of a-C coatings onto cardiovascular stents.
  • Introduction of our asymmetric bipolar MF pulsed DC technology and power supplies.
  • Establishment of new contacts with respect to be involved in new projects in the field.

www.mac-co.dir.bg

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NANOHARD 2007

  • OUTLINE
  • Introduction
  • Reactive Sputter Deposition – target poisoning and arc formation. MF pulsed DC power supplies.
    • Target poisoning, reasons and how to prevent it;
    • Arc suppression, “Soft arc handling” mode;
    • MF pulsed magnetron power supplies – variety of models;
    • Amorphous Diamond sputter deposition equipment.
  • Substrate biasing:
    • Unipolar pulsed bias power supplies - applications;
    • Our own asymmetric bipolar technology;
    • Asymmetric bipolar MF pulsed DC bias power supply;
  • Future trends – bipolar pulsed magnetron PS.
  • Conclusion

www.mac-co.dir.bg

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NANOHARD 2007

INTRODUCTION

  • Reactive Sputter Deposition of insulating layers.
  • Target poisoning and arc formation.
  • Unipolar MF pulsed DC power supplies
  • Bipolar MF pulsed DC power supplies

www.mac-co.dir.bg

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NANOHARD 2007

REACTIVE SPUTTER DEPOSITION 1

  • Target poisoning and how to prevent it – complete solution.
  • MF pulsed magnetron power supplies – best choice:
    • Fast Arc suppression, Soft Arc Handling mode;
    • Straight DC and unipolar MF pulsed modes of operation;
    • Frequency range 50 to 150 kHz, duty cycle range 0,2 to 0,75;
    • Pulsed power supplies working in pulsed mode only at fixed 60 kHz frequency.

www.mac-co.dir.bg

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NANOHARD 2007

REACTIVE SPUTTER DEPOSITION 2

  • New voltage waveform concept for higher ionization and lower arc formation probability.
  • Suitable for industrial scale sputter deposition of highly insulating layers, such as Al2O3 and AlN.
  • 10 kW MF pulsed magnetron power supplies, working at fixed 50 kHz. Soft Arc Handling capability.

Voltage waveform Current waveform

www.mac-co.dir.bg

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NANOHARD 2007

REACTIVE SPUTTER DEPOSITION 3

  • Amorphous Diamond Sputter Deposition
    • Circular cathodes for flange mounting. Two Cathodes’ Closed Field Unbalanced Magnetron Sputter System.
    • Unipolar pulsed magnetron power supply, working at fixed 60 kHz; High voltage pulses for high ionization probability.
    • Multi - layer coatings, based on Ti and Carbon, reactively sputtered in N2 atmosphere. Pulsed substrate biasing.

www.mac-co.dir.bg

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NANOHARD 2007

REACTIVE SPUTTER DEPOSITION 4

  • Unipolar pulsed substrate biasing both during ion etching and sputter deposition.
  • Cardiovascular stents with biocompatible Carbon based coatings.
  • Three – dimensional deposition conditions.
  • Ti ion etching and base coating prior to deposition of Carbon – based coating. Multi – layer design.
  • Both a-C and C3N4 biocompatible top layer possibility.

www.mac-co.dir.bg

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NANOHARD 2007

ASYMMETRIC BIBOLAR PULSED TECHNOLOGY

  • OUR OWN ASYMMETRIC BIPOLAR PULSED TECHNOLOGY
  • Negative pulse amplitude adjustment in the range –20 to –200V;
  • Positive pulse amplitude depends on the output current magnitude and is in the range +15 to +50V;
  • Duty cycle adjustment in the range 0,12 to 0,42;
  • Negative pulse current limiting along with acting as a voltage source during the positive pulse.

www.mac-co.dir.bg

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NANOHARD 2007

ASYMMETRIC BIBOLAR PULSED TECHNOLOGY

FUTURE TRENDS

  • Asymmetric bipolar MF pulsed DC magnetron power supply design – both working at fixed 60 kHz or in the frequency range 50 to 100 kHz.
  • Magnetron power supply, supporting straight DC, unipolar and asymmetric bipolar pulsed modes, 1kW output power for lab applications.
  • Fast arc suppression, switching – off time as short as 600 ns, Soft Arc Handling mode.

www.mac-co.dir.bg

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NANOHARD 2007

CONCLUSION

  • Complete solutions
  • Rugged and reliable equipment
  • Customer specified pulsed power supplies
  • Best “performance to cost” ratio
  • Trusted and reliable delivery all over the world
  • Co-operation

www.mac-co.dir.bg

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