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NANOHARD 2007

NANOHARD 2007. MF pulsed DC power supplies for PVD processes . Milko Angelov. Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria. www.mac-co.dir.bg. NANOHARD 2007. PURPOSE

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NANOHARD 2007

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  1. NANOHARD 2007 MF pulsed DC power supplies for PVD processes Milko Angelov Milko Angelov Consulting Co Ltd., Plovdiv, Bulgaria www.mac-co.dir.bg

  2. NANOHARD 2007 • PURPOSE • Presentation of developed MF pulsed DC power supplies for reactive film deposition with special attention to reactive magnetron sputtering and substrate biasing. • Target poisoning and arc management. How to increase ionization and simultaneously to decrease arc formation probability. • Introduction of our new equipment for deposition of a-C coatings onto cardiovascular stents. • Introduction of our asymmetric bipolar MF pulsed DC technology and power supplies. • Establishment of new contacts with respect to be involved in new projects in the field. www.mac-co.dir.bg

  3. NANOHARD 2007 • OUTLINE • Introduction • Reactive Sputter Deposition – target poisoning and arc formation. MF pulsed DC power supplies. • Target poisoning, reasons and how to prevent it; • Arc suppression, “Soft arc handling” mode; • MF pulsed magnetron power supplies – variety of models; • Amorphous Diamond sputter deposition equipment. • Substrate biasing: • Unipolar pulsed bias power supplies - applications; • Our own asymmetric bipolar technology; • Asymmetric bipolar MF pulsed DC bias power supply; • Future trends – bipolar pulsed magnetron PS. • Conclusion www.mac-co.dir.bg

  4. NANOHARD 2007 INTRODUCTION • Reactive Sputter Deposition of insulating layers. • Target poisoning and arc formation. • Unipolar MF pulsed DC power supplies • Bipolar MF pulsed DC power supplies www.mac-co.dir.bg

  5. NANOHARD 2007 REACTIVE SPUTTER DEPOSITION 1 • Target poisoning and how to prevent it – complete solution. • MF pulsed magnetron power supplies – best choice: • Fast Arc suppression, Soft Arc Handling mode; • Straight DC and unipolar MF pulsed modes of operation; • Frequency range 50 to 150 kHz, duty cycle range 0,2 to 0,75; • Pulsed power supplies working in pulsed mode only at fixed 60 kHz frequency. www.mac-co.dir.bg

  6. NANOHARD 2007 REACTIVE SPUTTER DEPOSITION 2 • New voltage waveform concept for higher ionization and lower arc formation probability. • Suitable for industrial scale sputter deposition of highly insulating layers, such as Al2O3 and AlN. • 10 kW MF pulsed magnetron power supplies, working at fixed 50 kHz. Soft Arc Handling capability. Voltage waveform Current waveform www.mac-co.dir.bg

  7. NANOHARD 2007 REACTIVE SPUTTER DEPOSITION 3 • Amorphous Diamond Sputter Deposition • Circular cathodes for flange mounting. Two Cathodes’ Closed Field Unbalanced Magnetron Sputter System. • Unipolar pulsed magnetron power supply, working at fixed 60 kHz; High voltage pulses for high ionization probability. • Multi - layer coatings, based on Ti and Carbon, reactively sputtered in N2 atmosphere. Pulsed substrate biasing. www.mac-co.dir.bg

  8. NANOHARD 2007 REACTIVE SPUTTER DEPOSITION 4 • Unipolar pulsed substrate biasing both during ion etching and sputter deposition. • Cardiovascular stents with biocompatible Carbon based coatings. • Three – dimensional deposition conditions. • Ti ion etching and base coating prior to deposition of Carbon – based coating. Multi – layer design. • Both a-C and C3N4 biocompatible top layer possibility. www.mac-co.dir.bg

  9. NANOHARD 2007 ASYMMETRIC BIBOLAR PULSED TECHNOLOGY • OUR OWN ASYMMETRIC BIPOLAR PULSED TECHNOLOGY • Negative pulse amplitude adjustment in the range –20 to –200V; • Positive pulse amplitude depends on the output current magnitude and is in the range +15 to +50V; • Duty cycle adjustment in the range 0,12 to 0,42; • Negative pulse current limiting along with acting as a voltage source during the positive pulse. www.mac-co.dir.bg

  10. NANOHARD 2007 ASYMMETRIC BIBOLAR PULSED TECHNOLOGY FUTURE TRENDS • Asymmetric bipolar MF pulsed DC magnetron power supply design – both working at fixed 60 kHz or in the frequency range 50 to 100 kHz. • Magnetron power supply, supporting straight DC, unipolar and asymmetric bipolar pulsed modes, 1kW output power for lab applications. • Fast arc suppression, switching – off time as short as 600 ns, Soft Arc Handling mode. www.mac-co.dir.bg

  11. NANOHARD 2007 CONCLUSION • Complete solutions • Rugged and reliable equipment • Customer specified pulsed power supplies • Best “performance to cost” ratio • Trusted and reliable delivery all over the world • Co-operation www.mac-co.dir.bg

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