Plasma chemistry and film growth in a complex organic system
This presentation is the property of its rightful owner.
Sponsored Links
1 / 34

Plasma chemistry and film growth in a complex organic system PowerPoint PPT Presentation


  • 75 Views
  • Uploaded on
  • Presentation posted in: General

Plasma chemistry and film growth in a complex organic system. 1 MJ Goeckner, 1 C Estrada-Raygoza, 1 G Padron-Wells, 1 P.L.S. Thamban, 1 L.J. Overzet, 2 M. Senike and 2 M. Hori. 1 University of Texas at Dallas 2 Plasma Nanotechnology Center (Plant), Nagoya University. Motivation.

Download Presentation

Plasma chemistry and film growth in a complex organic system

An Image/Link below is provided (as is) to download presentation

Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author.While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server.


- - - - - - - - - - - - - - - - - - - - - - - - - - E N D - - - - - - - - - - - - - - - - - - - - - - - - - -

Presentation Transcript


Plasma chemistry and film growth in a complex organic system

Plasma chemistry and film growth in a complex organic system

1MJ Goeckner, 1C Estrada-Raygoza, 1G Padron-Wells, 1P.L.S. Thamban, 1L.J. Overzet, 2M. Senike and 2M. Hori

1University of Texas at Dallas

2 Plasma Nanotechnology Center (Plant), Nagoya University


Motivation

Motivation

Plasma Polymerized Parylene C

High

adhesion!

(UTD data)

ClpX precursor for Parylene C

Adhesion lifetimes

Protective layer

1 hour, standard parylene

85 hrs, PE-Parylene

Lactated Ringer’s solution @ 100 C

8 hrs, standard parylene

Implants

MEMs

176 hrs, PE Parylene

Lactated Ringer’s solution @ 20 C

Bienkiewicz, Med. Dev. Technol., January/February (2006) 10-11.


Plasma chemistry and film growth in a complex organic system

Goal: Control of film properties

Objective:

Prediction and control of film properties.

Strategy:

Understand how plasma chemistry affects both film formation and polymerization.

Electrical

System

Plasma phase

Plasma

Vaccum system

Pressure, Power

Flow rate, chuck temperature

Wall conditioning

Surface


How to tackle this challenge

1

Plasma operational variables vs. plasma chemistry?

Plasma operational variables vs. film growth/properties?

2

Plasma chemistry vs. film growth/polymerization?

3

How to tackle this challenge?

Relate the plasma chemistry with film formation and plasma polymerization processes

Goal:


How to tackle this challenge1

1

Plasma operational variables vs. plasma chemistry?

Plasma operational variables vs. film growth/properties?

2

Plasma chemistry vs. film growth/polymerization?

3

How to tackle this challenge?

Relate the plasma chemistry with film formation and plasma polymerization processes

Goal:


Plasma chemistry and film growth in a complex organic system

Operational variables and key variables

  • Operational Variables:

  • Time of the discharge

  • Pressure

  • RF power

  • Flow rate

  • Walls of reactor

  • Film substrate

  • Chuck temperature

  • Key variables:

  • Interaction time

  • Density of particles

  • Energy to break bonds

  • Residence time (Probability for collisions)

  • Heterogeneous reactions

  • Adsorption/desorption mechanisms.

  • Adsorption/desorption

Gas phase

Surface


Plasma chemistry and operational variables

Dissociation

FTIR

Identify

Plasma

chemistry

+

+

Quantify

Excitation

&

Ionization

OES

(e-beam)

Plasma chemistry and operational variables

  • Operational Variables:

  • Pressure

  • RF power

  • Flow rate

Plasma

chemistry

Electrical

System

Species densities

Plasma

Vaccum system


Identification of major species ftir

Identification of major species - FTIR

Wavenumber (cm-1)


Identification of major species direct oes

Identification of major species – Direct OES


Summary plasma species identification

Summary: plasma species identification

Dissociation

FTIR

+

OES and

OES e-beam

Excitation

&

Ionization

HClH2

C2H2Cl2

CH4

H, Cl, CH

HCl+

CH+

Plasma

Neutrals

Radicals

Ions


Quantification of neutral major species by ftir

1.0

40

80

120

160

PT=60mTorr

0.5

2ClpX

C2H2 x20

Ni/N60mTorr

CH4 x20

HCl

1.0

PT=7.5mTorr

2ClpX

0.5

Ni/N7.5mTorr

C2H2 x20

HCl

0.0

40

80

120

160

Quantification of neutral major species by FTIR

Plasma chemistry is strongly affected by pressure

nClpx + nHCl⇒ 0.6 nTotal

nClpx + nHCl⇒ nTotal

Energy (eV/molec)


Oes emission spectroscopy vs e beam oes

OES

main chamber

OES

disadvantage:

Cl2 + 2ClpX*

Cl2

Absolute density

calculation

not trivial

CH

Cl2+ or C4H2+

Ha

HCl+

Hb

Cl

H2

CH

Cl2

Ar

HCl+

Ebeam tool

is possible *

Ha

Hb

OES

ebeam

CH

Cl

Cl2

H2

OES emission spectroscopy vs e-beam OES

* P.L.S. Thamban, J. Hosch, M.J. Goeckner, Rev. Sci. Instrum. 81 (2010) 013502.


Electron impact disociative excitation of chloro p xylene

Electron impact disociative excitation of chloro-p-xylene

Electron impact disociative excitation of ClpX

Electron impact disociative excitation of chlorobenzene

HCl+

250

300

350

400

450


Radical information by e beam oes

Radical information by e-beam OES

HCl+

benzyl

305

300

350

250

Red shift from benzyl

316.5 nm

310 nm


E beam oes tracking of species

GEC

E-beam

on

Ha

HCl+

Hb

Cl2

CH

CH

e-beam OES tracking of species

Goal: Observation of the trends for of excited species in plasma

on

P.L.S. Thamban, J. Hosch, M.J. Goeckner,

Rev. Sci. Instrum. 81 (2010) 013502.


Hcl relation with main chamber hcl density

Challenges for absolute

density calculation:

1) High deposition on electron

source walls

2) High dielectric deposition on

Faraday Cup

Ebeam

FTIR

HCl+ relation with main chamber HCl density


How to tackle this challenge2

Plasma operational variables vs. plasma chemistry?

1

Plasma chemistry vs. film growth/polymerization?

Plasma operational variables vs. film growth/properties

3

2

How to tackle this challenge?

Relate the plasma chemistry with film formation and plasma polymerization processes

Goal:


Plasma discharge effect in film properties

Plasma discharge effect in film properties

Solid film

High pressure

Film formation

Low

pressure

Condensation of monomer

Evaporates in a few hours

EXCELLENT adhesion

Oily film

High

pressure

Evaporating for 8 months

Plasma

No plasma

Film

properties

Plasma processing

conditions

Plasma

Chemistry?


Plasma chemistry vs film formation

Plasma chemistry vs Film formation

Solid film

W (J/s)

F (molec/s)

Low

pressure

Kinetic regime

60mTorr

EXCELLENT adhesion

30mTorr

Intermediate

pressure

High Power

Solid film

15mTorr

Oily film

7.5mTorr

High

pressure

Mass transport regime

Evaporating for 8 months

Monomer

eV/molec

0, 3.1, 9.2, 27.5, 76.4, 152.9


Plasma parylene c films

Plasma Parylene C films

IRRAS s polarization

Normalized Intensity (cps)

**Characterization done at Hori-Sekine Lab at

University of Nagoya


How to tackle this challenge3

Plasma operational variables vs. plasma chemistry?

Plasma operational variables vs. film growth/properties?

1

2

Plasma chemistry vs. film growth/polymerization?

3

How to tackle this challenge?

Relate the plasma chemistry with film formation and plasma polymerization processes

Goal:


Plasma monomer density effect in film growth

Plasma monomer density effect in film growth

100 W

50 W

18 W

2 W

ClpX polymerization is a surface reaction


Monomer concentration vs film growth polymerization

Monomer concentration vs Film growth/polymerization

Monomer density in the plasma

is affecting film growth


Chuck temperature vs film growth

Chuck Temperature vs Film growth

Reaction controlled

Tchuck=50 C

Tchuck=23 C

Tchuck=40 C

For gas CVD process

Mass transfer controlled


Polymerization mechanism

Polymerization mechanism?

CVD Par C

Plasma Par C ?

Polymer

X

Monomer + HCl 60-99%

HClH2

C2H2Cl2

CH4

H, Cl, CH

HCl+

CH+

Plasma

Plasma


Polymerization mechanism1

Polymerization mechanism?

CVD Par C

Plasma Par C ?

HClH2

C2H2Cl2

CH4

H, Cl, CH

HCl+

CH+

Plasma


Polymerization mechanism2

Polymerization mechanism?

  • 1. Precursors formation:

  • Gas phase

  • Surface

  • 2. Polymerization

  • Initiation

  • Propagation

  • Termination

Free radicals?

Ionic?


Ion bombardment

Ion bombardment

Ion bombardment

Silicon cover

Sample

Polymerization of PACVD Parylene C is IONIC


Summary

Summary

Plasma chemistry is directly related to the film deposition and polymerization processes.

Plasma CVD is capable of producing textured and crystalline polymer films.


Plasma chemistry and film growth in a complex organic system

Ackowdledgements

Verity Instruments

specially Dr. Jimmy Hosch

Hori-Sekine Lab group at University of Nagoya,

specially Prof. Hori and Prof. Ishikawa

Aichi Science and Technology Foundation

This work was funded by CONACYT (Mexico), the US National Science Foundation and Verity Instruments. This material is based upon work supported by the National Science Foundation under Grant No. CBET 1129395.Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.


Plasma chemistry and film growth in a complex organic system

Thank you for your attention

Questions?


Plasma polymerization of parylene c

Plasma polymerization of Parylene C

PA CVD polymer

CVD polymer

  • Increased adhesion to several substrates

  • Selective deposition

  • Texture control

  • Film properties not compromised


Why plasma assisted cvd

Why Plasma Assisted CVD?

HT Parylene

SELECTIVE PARYLENE C DEPOSITION

Silicon, Glass, TiO2 NaCl

PEN

Au, Al, Stainless Steel

Excellent adhesion to

Polymer film

Not extensive surface cleaning.

No pre-treatment for optimal adhesion

Bad adhered film


Plasma chemistry and film growth in a complex organic system

Ongoing Work

  • Ionization & excitation processes?

  • Quantification of radicals (H, Cl, CH)

  • Polymerization mechanism?


  • Login