Reaction Engineering: Chemical Vapor Deposition CVD. Quak Foo Lee Department of Chemical and Biological Engineering The University of British Columbia 2003. What is CVD?. Thin film formation from vapor phase reactants. Deposited films range from metals to semiconductors to insulators.
Reaction Engineering:Chemical Vapor DepositionCVD
Quak Foo Lee
Department of Chemical and Biological EngineeringThe University of British Columbia
Main Gas Flow Regime
Gas Phase Reactions
Desorption of Volatile Surface Reaction Products
Redesorption of Film Precursor
Transport to Surface
Nucleation and Island Growth
Adsorption of Film Precursor
CVD reactors must be designed and operated in such a manner that film thickness, crystal structure, surface morphology, and interface composition
changes can be accurately controlled.