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Study of sputtering on thin films due to ionic implantations

Fig. 01: SRIM Simulation of implantion of Xe into Ti + Si. Fig. 03: The physical phenomena of Sputtering with Xe beam into Ti + Si. Fig. 02: RUMP spectrum for Ti over Si and the prediction of Ar and Xe ions on the surface. Fig-04: The RBS Analysis Method.

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Rbs analysis method - PowerPoint PPT Presentation

Study of sputtering on thin films due to ionic implantations