'Cd control' presentation slideshows

Alain C. Diebold

Metrology and Characterization Requirements and Challenges for the Nano-World of Integrated Circuits And Its Overlap with Nano Technology and Science. Alain C. Diebold. AGENDA. The ITRS Challenge Litho Metrology FEP & Interconnect Metrology Materials Characterization.

872 views • 60 slides

Metrology Roadmap 2003 Update

Metrology Roadmap 2003 Update. Europe Ulrich Mantz (Infineon) Mauro Vasconi (ST) Japan Yuichiro Yamazaki (Toshiba) Kazuo Nishihagi (Technos) Korea Taiwan Fang-Cheng Chen (TSMC) J.H. Shieh (TSMC) B.C. (Harry) Perng (TSMC) US Steve Knight (NIST)

400 views • 26 slides

Design and System Driver Chapters July Meeting San Francisco, California Design TWG (Europe, Japan, and U.S.)

Design and System Driver Chapters July Meeting San Francisco, California Design TWG (Europe, Japan, and U.S.).

366 views • 25 slides

339 views • 22 slides

Metrology Roadmap 2003 Update and ISMT Project Plans

Metrology Roadmap 2003 Update and ISMT Project Plans. Europe Ulrich Mantz (Infineon) could not travel Mauro Vasconi (ST) on phone Japan Yuichiro Yamazaki (Toshiba) Kazuo Nishihagi (Technos) Korea Taiwan US Steve Knight (NIST) Alain Diebold (Int. SEMATECH)

345 views • 20 slides

Lithography ITWG Update ITRS Conference July 24, 2002 San Francisco

Lithography ITWG Update ITRS Conference July 24, 2002 San Francisco. ITWG Chairmen and Co-Chairmen. Litho ITWG proposal for 2002 update. The mask tables will be updated. Both optical and NGL mask tables. Working group still discussing details.

279 views • 11 slides