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20 ge concentration - PowerPoint PPT Presentation

This work is supported by NREL under subcontract #XXL-5-44205-09 and NSF under grant # DMR-0307594

PECVD Growth Of Si x :Ge 1-x Films For High Speed Devices and MEMS. Srinivasan Kannan a with P.C. Taylor a and D.D.Allred b a University of Utah b Brigham Young University. Abstract. Stress Measurements in Si x :Ge 1-x.

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20 ge concentration - PowerPoint PPT Presentation

This work is supported by NREL under subcontract #XXL-5-44205-09 and NSF under grant # DMR-0307594