Bottom up technology
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Bottom-up Technology. Toshitake Takahashi. A. B. C. Exfoliate. PmPV Suspension in DCE solvent. E. D. Centrifuge. Background on the synthesis of graphene sheet and graphene nanoribbon. Fabrication method so far. - Peel-off method Epitaxial growth Chemically.

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Bottom-up Technology

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Bottom up technology

Bottom-up Technology

Toshitake Takahashi


Bottom up technology

A

B

C

Exfoliate

PmPV Suspension

in DCE solvent

E

D

Centrifuge

Background on the synthesis of graphene sheet and graphenenanoribbon

Fabrication method so far

  • - Peel-off method

  • Epitaxial growth

  • Chemically

Required new approach for

Large scale application

K. S. Novoselov, et al. Science 2004, 306, 666.

Li, X. L. et al. Science 319, 1229–1232 (2008)

W. A. de Heer, et. al. Science 2006, 312, 1191.


Bottom up technology

Making GNR from MWCNT

  • - PMMA- MWCNT film was peeled off in KOH solution

  • Top side wall of MWCNT were etched faster and

  • removed by plasma


Bottom up technology

Diameter/Width/Height distribution

Diameter distribution of pristine MWCNT

Width and height distribution of GNR


Bottom up technology

Electrical property of GNR

7 nm-wide GNR device

measured in air

  • p-type behavior due to

  • Physisorbed O2

16 nm-wide GNR device

measured in vacuum

  • After electrical annealing

  • Symmetric electron and hole

  • transport


Bottom up technology

GNR fabrication with nanowire as etching mask


Bottom up technology

Electrical characteristic of GNR

  • Transfer characteristic is strongly dependent on width

  • Opening of bandgap due to enhanced carrier confinement

  • and edge effect as GNR width is reduced


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