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Glancing Angle Deposition ( GLAD )

Glancing Angle Deposition ( GLAD ). Progress report. Reporter: Zhibin Luo Jul 11 th 2013. Glancing angle deposition JVSTA 2007 Matthew M. Hawkeye. Thin Film Deposition. Substrate. Vapor. Deposition Source. UHV. PVD. CVD. Atomic Layer Deposition Chem. Rev. 2010 Steven M. George.

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Glancing Angle Deposition ( GLAD )

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  1. Glancing Angle Deposition(GLAD) Progress report Reporter: Zhibin Luo Jul 11th 2013 Glancing angle deposition JVSTA 2007 Matthew M. Hawkeye

  2. Thin Film Deposition Substrate Vapor Deposition Source UHV PVD CVD Atomic Layer Deposition Chem. Rev. 2010 Steven M. George

  3. Initial growth of the thin film Layer growth The atoms are more strongly bound to the substrate than to each other Atoms Substrate Islandgrowth Atoms The interaction between the atoms is greater than the interaction with the substrate Substrate Layerplus island growth Atoms will initially cover the surface in monolayers due to the strong interaction with the substrate, but after the deposition of one or several layers, islanding will occur Atoms Substrate

  4. Structure zone models Substrate temperature T/Tm The temperature is too low for any significant diffusion to occur Surface diffusion strongly influences the growth There is sufficient energy for bulk diffusion to occur

  5. Glancing Angle Deposition Substrate Incident Vapor Flux ψ α Vapor Deposition Source Substrate UHV GLAD

  6. Archetypal GLAD fabricated microstructures Tilted columns Zig-zag columns Helical columns Vertical columns

  7. Self-shadowing StageⅠ StageⅡ tanα=2tanβ The atoms evaporate from the surface or buried by the arrival of new atoms

  8. Deposition onto nonplanar substrates Improving the uniformity Postdeposition processing or initial seeds for column growth Embossing、laser-direct write lithography、monolayers of self-assembled nanospheres、optical lithography, etc

  9. Archetypal GLAD fabricated microstructures Tilted columns Zig-zag columns Helical columns Vertical columns

  10. PhiSweep Orientation Sweep axis Angle from central sweep axis

  11. Orientation Sweep axis 90°turn to create square helix

  12. Film properties and applications First, because the films possess an internal microstructure, the exposed surface area of the film is dramatically higher than in a dense coating Second, the particular geometry of the micro and nanostructures produced with the GLAD technique can directly impact various physical properties Dichrosim、birefringence and anisotropic resitivity Applications Dye sensitized solar cells(DSSCs) Sensor devices Photocatalyze the degradation of organic chemicals Materials for electrochemical supercapacitors Surface chemistry applications

  13. Thanks for your attentions! It’s my great honour to have your precious opinions.

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