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Glancing Angle Deposition ( GLAD ). Progress report. Reporter: Zhibin Luo Jul 11 th 2013. Glancing angle deposition JVSTA 2007 Matthew M. Hawkeye. Thin Film Deposition. Substrate. Vapor. Deposition Source. UHV. PVD. CVD. Atomic Layer Deposition Chem. Rev. 2010 Steven M. George.

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Glancing Angle Deposition ( GLAD )

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Glancing angle deposition glad

Glancing Angle Deposition(GLAD)

Progress report

Reporter: Zhibin Luo

Jul 11th 2013

Glancing angle deposition JVSTA 2007 Matthew M. Hawkeye


Glancing angle deposition glad

Thin Film Deposition

Substrate

Vapor

Deposition Source

UHV

PVD

CVD

Atomic Layer Deposition Chem. Rev. 2010 Steven M. George


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Initial growth of the thin film

Layer growth

The atoms are more strongly bound to the substrate than to each other

Atoms

Substrate

Islandgrowth

Atoms

The interaction between the atoms is greater than the interaction with the substrate

Substrate

Layerplus island growth

Atoms will initially cover the surface in monolayers due to the strong interaction with the substrate, but after the deposition of one or several layers, islanding will occur

Atoms

Substrate


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Structure zone models

Substrate temperature T/Tm

The temperature is too low for any significant diffusion to occur

Surface diffusion strongly influences the growth

There is sufficient energy for bulk diffusion to occur


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Glancing Angle Deposition

Substrate

Incident Vapor Flux

ψ

α

Vapor

Deposition Source

Substrate

UHV

GLAD


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Archetypal GLAD fabricated microstructures

Tilted columns

Zig-zag columns

Helical columns

Vertical columns


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Self-shadowing

StageⅠ

StageⅡ

tanα=2tanβ

The atoms evaporate from the surface or buried by the arrival of new atoms


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Deposition onto nonplanar substrates

Improving the uniformity

Postdeposition processing or initial seeds for column growth

Embossing、laser-direct write lithography、monolayers of self-assembled nanospheres、optical lithography, etc


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Archetypal GLAD fabricated microstructures

Tilted columns

Zig-zag columns

Helical columns

Vertical columns


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PhiSweep

Orientation

Sweep axis

Angle from central sweep axis


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Orientation

Sweep axis

90°turn to create square helix


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Film properties and applications

First, because the films possess an internal microstructure, the exposed surface area of the film is dramatically higher than in a dense coating

Second, the particular geometry of the micro and nanostructures produced with the GLAD technique can directly impact various physical properties

Dichrosim、birefringence and anisotropic resitivity

Applications

Dye sensitized solar cells(DSSCs)

Sensor devices

Photocatalyze the degradation of organic chemicals

Materials for electrochemical supercapacitors

Surface chemistry applications


Glancing angle deposition glad

Thanks for your attentions!

It’s my great honour to have your precious opinions.


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