1 / 13

Ion implanter – HV terminal 500 kV a number of Nielsen and RF ion sources

Ion implanter – HV terminal 500 kV a number of Nielsen and RF ion sources for gaseous and solid materials mass analysis better than 1 a.m.u. beam current from 1-100 m A, beam scanning system target area up to 5 cm diameter. 2MV Van de Graaff ion accelerator

Download Presentation

Ion implanter – HV terminal 500 kV a number of Nielsen and RF ion sources

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript


  1. Ion implanter – HV terminal 500 kV a number of Nielsen and RF ion sources for gaseous and solid materials mass analysis better than 1 a.m.u. beam current from 1-100 mA, beam scanning system target area up to 5 cm diameter

  2. 2MV Van de Graaff ion accelerator RF source for light ions - H, He and their isotopes RBS – beam line in preparation

  3. UHV chamber for thin film deposition e-beam or thermal evaporation

  4. Thin film coating unit for SEM sample preparation Dual ion miller for TEM specimen preparation

  5. TEM – Philips EM400 120 keV

  6. TEM – Philips EM400T 120 keV

  7. SEM – Philips EM500 Oxford Instruments EDAX

  8. SEM – JEOL 25N with EPMA (e-microprobe)

  9. ANA HV thin film deposition unit with dual ion beams

  10. EMA 10 – UHV system Surface analysis- LEIS i SIMS (low energy ion scattering and Secondary ion mass spectroscopy)

  11. Balzers SPUTTRON II thin film deposition system d.c. and r.f. sputtering, four target elements, raective deposition

  12. Balzers BAK 550 evaporation system e-beam (four teagles) or thermal evaporation, thickness and deposition rate monitor, programmable four layer deposition, reactive evaporation, residual gas analyzer, flash evaporation

  13. Talistep – thin film thickness and surface roughness measurements

More Related