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Modeling and Simulation ITWG Jürgen Lorenz - FhG-IISB. ITWG/ TWG Members. H. Jaouen, STM * W. Molzer, Infineon * R. Woltjer, Philips * G. Le Carval, LETI J. Lorenz, Fraunhofer IIS-B * W. Schoenmaker, IMEC * supported by EC User Group UPPER+ T. Wada, SELETE S. Sato, Fujitsu

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Modeling and Simulation ITWG Jürgen Lorenz - FhG-IISB

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Modeling and simulation itwg j rgen lorenz fhg iisb

Modeling and Simulation ITWG

Jürgen Lorenz - FhG-IISB

ITWG/TWG Members

H. Jaouen, STM*

W. Molzer, Infineon*

R. Woltjer, Philips*

G. Le Carval, LETI

J. Lorenz, Fraunhofer IIS-B*

W. Schoenmaker, IMEC

* supported by EC User Group UPPER+

T. Wada, SELETE

S. Sato, Fujitsu

Japanese TWG 16 industrial members

C. Riccobene, AMD

M. Giles, INTEL

M. Orlowski, Motorola

M. Meyyappan, NASA

V. Bakshi, SEMATECH

J. Wu, TI

E. Hall, Arizona State Univ.

J.-H. Choi, Hynix

K.H. Lee, Samsung


Modeling and simulation itwg j rgen lorenz fhg iisb

Key Messages (I)

  • Update of key messages from 2001/2002 ITRS:

  • Technology modeling and simulation is one of a few enabling methodologies that can accelerate development times and reduce development costs: Assessment up to 35% in 2003

  •  important not only in years of difficult economic conditions

  • Modeling and simulation provides an ‘embodiment of knowledge and understanding’. It is a tool for technology/device optimization and also for training/education

  • Accurate experimental characterization is essential

  • Art of modeling:

  • - Combine different experiments & theory to extract physical mechanisms

  • & parameters

  • - Find appropriate trade-off between detailed physical simulation (CPU and

  • memory costly) and simplified but physically appropriate approaches


Modeling and simulation itwg j rgen lorenz fhg iisb

Key Messages (II)

  • Further growing importance of atomistic/hierarchical/multilevel simulation, materials - appropriate treatment of nanostructures

  • Extension of cross-cut links to the other ITRS sections ongoing process

  • Specific problem for 2003

  • - Delays in guidelines, + travel restrictions at companies

  • - Need for additional participation esp. from Korea, Taiwan, and partly

  • also USA


Modeling and simulation itwg j rgen lorenz fhg iisb

M& S 2003 Sequence of Actions

  • Requirements: Update 2003 & critically review & simplify 2003 tables

  • (still valid details into text) - also for readability and preparation for 2004

  • • Critically update challenges (timing and content)

  • Consider transition into Nano Era

  • Further strengthen interactions with other ITWGs

  • (esp. around San Francisco meeting)

  • ITWG composition: Updates in US and Japan on the way/done,

  • more contributions from Korea and Taiwan needed


Modeling and simulation itwg j rgen lorenz fhg iisb

Technology Modeling SCOPE & SCALES

  • Equipment related

    • Equipment/feature scale

    • Lithography

  • Feature scale

    • Front End, Back End

    • Device

2001/2 Chapter sub-sections in blue - (slight changes in 2003 in progress)

  • IC-scale

  • Circuit elements

  • Package modeling

  • Interconnect performance modeling

•Materials Modeling

•Numerical Methods


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Challenges: Major Changes

  • Modeling hierarchy included  “Modeling of shallow junctions” extended

  • to “Front-End Process Modeling for Nanometer Structures”

  • • “Ultimate nano-scale CMOS simulation capability” pulled in from long-term, replacing & partly incorporating “Gate-stack models for ultra-thin dielectrics” (phenomenological models)

  • • Rest of “Gate-stack models for ultra-thin dielectrics”incorporated into new long-term challenge on predictive “Modeling of processing and electrical properties of new materials“

  • • 2002 long-term challenge “Thermal-Mechanical-Electrical Modeling for interconnections and packaging“ pulled in to short-term (6th short-term challenge)

  • More precise phrasing & shift of emphasis / new aspects in other

  • challenges


Modeling and simulation itwg j rgen lorenz fhg iisb

Difficult Challenges > 45 nm: Status June 23, 2003


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-term Difficult Challenges

High-Frequency Circuit Modelingfor 5-40 Ghz applications

  • Needs

  • Efficient extraction and simulation of full-chip interconnect delay

  • Accurate and yet efficient 3D interconnect models, esp. for transmission lines and S-parameters

  • High-frequency circuit models including

    • non-quasi-static effects

    • substrate noise

    • parasitic coupling

  • Parameter extraction assisted by numerical electrical simulation instead of RF measurement

(From Philips)


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Difficult Challenges

Front-End Process Modeling for Nanometer Structures

Needs

  • Diffusion/activation/damage models and parameters incl. low thermal budget processes in Si-based substrate, e.g. Si, SiGe:C, (incl. strain), SOI and ultra-thin body devices

  • Characterization tools for ultra-shallow geometries and dopant levels

  • Modeling hierarchy from atomistic to continuum for dopants and defects in bulk and at interfaces

Source: A. Claverie, CEMES/CNRS, Toulouse, France


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Difficult Challenges

Modeling of Equipment Influences on Features Generated in Deposition and Etching Processes

Needs

  • Fundamental physical data ( e.g. rate constants, cross sections, surface chemistry); reaction mechanisms and reduced models for complex chemistries

  • Linked equipment/feature scale models

  • CMP (full wafer and chip level, pattern dependent effects)

  • •MOCVD, PECVD and ALD modeling

  • • Multi-generation equipment/wafer models

Simulated across-wafer variation of feature profile for a sputter-deposited barrier.


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Difficult Challenges

Lithography Simulation including NGL

Needs

  • Optical simulation of resolution enhancement techniques including mask optimization (OPC, PSM)

  • Predictive resist models incl. line-edge roughness, etch resistance and mechanical stability

  • Multi-generation lithography system models

Printing of defect on phase-shift mask: bump defect (top) vs. etch defect (lower)


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Difficult Challenges

Ultimate nanoscale CMOS simulation capability

Pulled in from long-term!

Needs

• Methods and algorithms which contribute to prediction of CMOS limits

• Quantum based simulators

• Models and analysis to enable design and evaluation of devices and

architectures beyond traditional planar CMOS

• Phenomenological gate stack models for ultra-thin dielectrics

• Models for device impact of statistical fluctuations in structures and dopant

distributions


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Difficult Challenges

Thermal-Mechanical-Electrical Modeling for interconnections and packaging

Pulled in from long-term!

Needs

• Model thermal-mechanical and electronic properties of Low-k, High-k

and conductors and the impact of processing on these properties

• Model reliability of packages and interconnects, e.g. Stress voiding,

electromigration, piezoelectric effects; textures, fracture, adhesion


Modeling and simulation itwg j rgen lorenz fhg iisb

Long-Term Challenges: Major Changes

  • “Extend beyond continuum tools” shifted to short-term & integrated there

  • into various challenges, esp. “Front-End Process Simulation”

  • Instead: “Modeling of processing and electrical properties of new materials”

  • “Ultimate nanoscale CMOS simulation capability“ shifted to short-term, including parts of old „gate stack modeling“ challenge

  • “Thermo-Mechanical-Electrical Modeling for Interconnections and Packaging” shifted to short-term

  • “Software Module Integration” skipped: Rather a requirement than a

  • challenge

  • Instead: “Nano-Scale Modeling” (e.g. nanotubes ...)

  • New challenge “Optoelectronics modeling”


Modeling and simulation itwg j rgen lorenz fhg iisb

Difficult Challenges < 45 nm


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Requirement: Major Changes

General:

- Some items now in “zebra” colour - according to ITRS guidelines:

“Limitations of available solutions will not delay the start of production. In some cases, work-arounds will be initially employed. Subsequent improvement is expected to close any gaps for production performance in areas such as process control, yield, and productivity.“

- This means for simulation: It can be used, but with more calibration, larger CPU time/memory, less generality then in the end required ...


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Requirement: Major Changes

Lithography:

- In exposure simulation no more emphasis on evaluation of wavelengths, but on capabilities of simulation incl. mask features and CPU efficiency

Gate stack:

- Short-term focus on high-k

- “Alternative” dielectrics / gates tbd with PIDS

Back-End Process/Equipment/Topography Modeling

- More clear structure, according to kinds of processes to be simulated


Modeling and simulation itwg j rgen lorenz fhg iisb

Short-Term Requirement: Major Changes

Numerical device modeling:

- Instead of “bulk CMOS” and “non-bulk” CMOS now “Classical CMOS” and “Non-classical CMOS incl.channel-engineered devices”

“Circuit element modeling/ECAD” replaced by

“circuit component modeling”& now structured into

- Active devices

- Interconnects and integrated passives

Package modeling now structuring into

- Electrical modeling

- Thermo-mechanical modeling

instead of an item “thermo-mechanical-electrical integrated models”


Modeling and simulation itwg j rgen lorenz fhg iisb

  • More details given in tables

  • Thank you


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