Ssi process backup using the svg
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SSI Process Backup using the SVG PowerPoint PPT Presentation


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SSI Process Backup using the SVG. Lilah Cook MCEE 550 Fall 2013 Factory Improvement Project Dr. Lynn Fuller. Revised: 4-8-14. SSI & SVG Coat. SSI Coat Experiment. SVG Coat Experiment. 2 Wafers coated using SVG track with Oir630 resist

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SSI Process Backup using the SVG

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Ssi process backup using the svg

SSI Process Backup using the SVG

Lilah Cook

MCEE 550 Fall 2013

Factory Improvement Project

Dr. Lynn Fuller

Revised: 4-8-14


Ssi svg coat

SSI & SVG Coat

SSI Coat Experiment

SVG Coat Experiment

2 Wafers coated using SVG track with Oir630 resist

Created program 6 on SVG track 1b to emulate the spin steps from the SSI

Check oven 1 temp ~140

Change oven 2 temp ~90

Remove lid on cover for manual dispense

Select program 1 on track 1a for the standard prime

Select program 6 on track 1b

Start 1a then 1b

Manually dispense resist when wafers reach spin coater

  • 2 Wafers coated using Coat.rcp with Oir620 resist

  • Coat.rcpbreakdoawn

    • Acceleration: 15 krpm

    • Oven 1 temp: 140 (60s)

    • Oven 2 temp: 90 (60s)

    • SpinSteps

      • 0  800 rpm (5s)

      • 800  3400 rpm (5s)

      • 3400  2000 rpm (25s)

    • Automatic dispense


Coat comparison

Coat Comparison

Spectramap 49 Point Resist Measurements:

SVG

Wafer 1: 10553 A Std 0.36%

Wafer 2: 10578 A Std 1.00%

SSI

Wafer 1: 10354 A Std 0.92%

Wafer 2: 10288 A Std 0.81%


Pattern and develop

Pattern and Develop

  • Lightly scribed the back of the SVG wafers and placed all four wafers into the ASML for level 1 and JG n well patterning

  • SSI Develop

    • Wafers went through the develop.rcp recipe with no problem

  • SVG Develop

    • SVG track has NO post exposure bake oven so replication would be impossible

    • Created Program 6 on track 2 which doubles the standard 60 second develop found in the SSI track

      • Needed to be broken up into two steps as max input in SVG in 99 seconds

    • Wafers developed with 60 seconds develop ad a 15 second rinse

      • Waiting for approval to add program steps to manual


Develop comparison

Develop Comparison


Conclusions

Conclusions

  • The above optical images shows that the nwell pattern has fully been developed

  • SVG tracks can be used to emulate the SSI track when patterning large features

    • Track 1a: Program 1 (standard Prime)

    • Track 1b: Program 6 (SSI Coat replica)

    • Track 2 : Program 6 (Oir620 Develop)

  • Working with SMFL staff to add program descriptions and recipes to the SVG manual


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