DownloadDopant Diffusion Jaeger Chapter 4 and Campbell Chapter 3






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Diffusion. 2. Diffusion SystemThe most common practice of introducing dopant into wafers by diffusion is the horizontal quartz tube furnaces similar to that used for thermal oxidation of silicon wafers. A separate furnace, wafer holder etc are reserved for a particular dopant to avoid contamination by other dopants.In general the dopant atoms are introduced in two separate diffusion steps, each in its own tube furnace. The first step is referred to as pre-deposition diffusion, it is aimed to 33648
Dopant Diffusion Jaeger Chapter 4 and Campbell Chapter 3

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