Because of equipment availability, cost, and time, we will use aluminum as the top side conductor. Top Side Conductor vacuum deposition Aluminum sputter deposit in Argon plasma. CVC 601-sputter deposition tool.
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Because of equipment availability, cost, and time, we will use aluminum as the top side conductor
CVC 601-sputter deposition tool
Top side conductor grid needs to be designed
Pattern is created on a transparency sheet to keep cost low
Once top side conductor grid is finalized, a chrome on glass professional mask can be made
Spin speed is set here
Light sensitive material is stored in amber dropper bottles – Use 1813
A vacuum chuck holds the wafer
Cells can be of various sizes but must line up for saw cutting
The antenna design, arrayed on a transparency sheet, is placed on top of the wafer. This transparency is called a photo mask. Production photo masks would be made on glass plates with high precision patterns.
UV light with filter surrounding it
Clear glass plates are used to make sure the transparency lays flat to the wafer
Exposure time set on timer
Wafer is held by vacuum, mask is placed on top and brought into contact with wafer
Top side conductor complete
Once the top side conductor grid is complete, the back side conductor can be deposited
For this fabrication run, aluminum will also be sputtered as the back side contact
Complete your top side conductor grid pattern and submit