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REMOVING SURFACE CONTAMINATES FROM SILICON WAFERS - PowerPoint PPT Presentation


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REMOVING SURFACE CONTAMINATES FROM SILICON WAFERS. Jed Johnson Brigham Young University. Reflectors in EUV range. EUV range is about 100-1000Å General Challenges: - multilayers required - absorption - high vacuum needed Applications - XUV lithography - Soft x-ray microscopy

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REMOVING SURFACE CONTAMINATES FROM SILICON WAFERS

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