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New materials advance next generation computers Charles Ahn, Yale University, DMR 1006256

New materials advance next generation computers Charles Ahn, Yale University, DMR 1006256.

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New materials advance next generation computers Charles Ahn, Yale University, DMR 1006256

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  1. New materials advance next generation computersCharles Ahn, Yale University, DMR 1006256 By adding a few layers of atoms of zirconium to today’s transistors, it may be possible to usher in a new era of computers, in which processors would retain their information even when turned off. The first applications of these new transistors would be for cell phones and computers that turn on instantaneously. At Yale, researchers have imaged a few atomic layers of zirconium atoms inserted between layers of aluminum oxide and silicon. Al2O3 ZrO2 Si 5 nm In this cross-section image, columns of atoms in silicon (small, periodic dots) are visible, as well as a few atomic layers of a new layered material, ZrO2. By applying voltage pulses across the layer of ZrO2, the transistor can be turned on or off and remember its state without the need for continuous power.

  2. How to make new materials for computers one atomic layer at a timeCharles Ahn, Yale University, DMR 1006256 Mark Davis, an undergraduate student, worked on making thin films commonly used to make computer chips. As part of this process, Mark controlled where individual layers of atoms went in the thin films. Afterward, he imaged these atoms using transmission electron microscopy. Mark also tested the devices electronically to find out how these atomic layers function. Glue Undergraduate Mark Davis grows thin layers of zirconium dioxide on silicon for computer applications using advanced thin film deposition techniques.

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