Lecture 9.0. Silicon Oxidation/Diffusion/Implantation. Silicon Oxidation. Reactor Furnace at T=850C Pure Oxygen Si + O 2 SiO 2 Kinetics BL-Mass Transfer J=K g (C A -0) SS-Diffusion J=D O-SiO2 (dC/dx) Heat Transfer BL, q=h(T 1 -T) Solid, q=k SiO2 (dT/dx) J=q/ H rxn.
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Increases with Energy